MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202518045992 A) filed by Georgia Tech Research Corporation, Atlanta, on May 13, for 'microneedles and methods of manufacture thereof.'
Inventor(s) include Mcallister Devin; Prausnitz Mark; Henry Sebastien; and Guo Xin Dong.
The application for the patent was published on June 6, under issue no. 23/2025.
According to the abstract released by the Intellectual Property India: "A method for making an array of microneedles, the method comprising, (a) providing a mold having an upper surface, an opposed lower surface, and an opening in the upper surface, wherein the opening leads to a first cavity proximal to the upper surface and to a plurality of second cavities, below the first cavity defining two or more microneedles, (b) partially loading into each second cavity, via the opening in the mold, a first material which comprises a substance of interest dissolved or suspended therein, (c) solidifying the first material in the mold to form only respective tip portions of two or more microneedles in the second cavities, wherein each of the tip portions comprises the substance of interest, (d) loading the first cavity and a proximal portion of the second cavities unoccupied following steps (b) and (c), via the opening in the mold, with a second material,(e) solidifying the second material in the mold to form respective remaining portions of the two or more microneedles, and (f) removing from the two or more microneedles from the mold, wherein at least part of one or more of steps (b)-(e) is conducted under centrifugation."
The patent application was internationally filed on Apr. 24, 2015, under International application No.PCT/US2015/027672.
Disclaimer: Curated by HT Syndication.
