MUMBAI, India, Feb. 13 -- Intellectual Property India has published a patent application (202611000966 A) filed by Dr. Divye Malhotra; Dr. Variyta V; Dr. Shubh Karmanjit Singh Bawa; Dr. Parul Sharma; and Dr. Akshat Sharma, Sundar Nagar, Himachal Pradesh, on Jan. 5, for 'metzi: a novel minimal-exposure technique for guided zygomatic implant placement.'
Inventor(s) include Dr. Divye Malhotra; Dr. Variyta V; Dr. Shubh Karmanjit Singh Bawa; Dr. Parul Sharma; and Dr. Akshat Sharma.
The application for the patent was published on Feb. 13, under issue no. 07/2026.
According to the abstract released by the Intellectual Property India: "Zygomatic implants are an essential solution for rehabilitation of the severely atrophic maxilla, yet traditional approaches require extensive flap elevation and significant sinus manipulation. This article introduces METZi (Minimal-Exposure Technique for Zygomatic Implants), a newly developed, guided surgical technique that enables precise trans- or extra-sinus implant placement through micro-exposure. METZi integrates skeletal bi-point referencing, patient-specific CBCT-based planning, a sinus membrane shielding system and tunnel access with minimal soft-tissue disruption. This intervention enhances patency, reduces morbidity, improves trajectory accuracy and eliminates reliance on costly navigation systems. This technique represents a major advancement in predictable and safe zygomatic implant rehabilitation."
Disclaimer: Curated by HT Syndication.
