MUMBAI, India, Oct. 11 -- Intellectual Property India has published a patent application (202527088541 A) filed by Chevron Phillips Chemical Company Lp, The Woodlands, U.S.A., on Sept. 17, for 'methods for releasing at least a portion of a halide from a surface.'
Inventor(s) include Alvez-Manoli, Gabriela D.; Bergmeister, Joseph; Carey, Spencer J.; and Stern, Donald A.
The application for the patent was published on Oct. 10, under issue no. 41/2025.
According to the abstract released by the Intellectual Property India: "Contacting an interior surface, optionally metal, of a petrochemical or refining process vessel with a halide or a halide-containing compound, wherein, as a result of the contracting, at least a portion of the halide is coupled to the interior surface; and releasing at least the portion of the halide coupled to the interior surface via contact thereof with hydrogen."
The patent application was internationally filed on Mar. 22, 2024, under International application No.PCT/US2024/021135.
Disclaimer: Curated by HT Syndication.
