MUMBAI, India, Sept. 26 -- Intellectual Property India has published a patent application (202548059022 A) filed by Daikin Industries, Ltd., Osaka, Japan, on June 19, for 'methods for producing halogenated alkene compound and fluorinated alkyne compound.'
Inventor(s) include Etou, Yuusuke; and Nakamura, Shingo.
The application for the patent was published on Sept. 26, under issue no. 39/2025.
According to the abstract released by the Intellectual Property India: "A halogenated alkene compound and a halogenated alkyne compound are obtained at a high conversion rate and high selectivity by employing any of the following methods (1) to (4): 10 (1) a halogenated butane compound represented by CX1X2X3CHX4CFHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are the same or different and each is a halogen atom, to a dehydrofluorination reaction; (2) a halogenated butene compound represented by 15 CX1X2X3CX4=CHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are as defined above, to a dehydrohalogenation reaction; (3) a halogenated alkane compound represented by CHX8A1CHX9A2, wherein A1 and A2 are each a fluorine atom or a perfluoroalkyl group, and X8 and X9 are the same or different 20 and each is a halogen atom, to a dehydrohalogenation reaction in the presence of a catalyst in a gas phase; and (4) a halogenated alkene compound represented by CX8A1=CHA2, wherein A1, A2, and X8 are as defined above, to a dehydrohalogenation reaction in the presence of a catalyst."
The patent application was internationally filed on Feb. 17, 2020, under International application No.PCT/JP2020/006018.
Disclaimer: Curated by HT Syndication.
