MUMBAI, India, Aug. 22 -- Intellectual Property India has published a patent application (202517050798 A) filed by Sony Group Corporation, Tokyo, on May 27, for 'method of producing a porous carbon material,porous carbon material,adsorbent, and fiber.'
Inventor(s) include Kai Ayumi; Tabata Seiichiro; and Shiroyama Masaya.
The application for the patent was published on Aug. 22, under issue no. 34/2025.
According to the abstract released by the Intellectual Property India: "The present technology is for improving a porous carbon material made from a plant-derived material and a manufacturing method thereof, and the main purpose of the present technology is to provide a technique capable of reducing the residual amount of a silicon component in a material when manufacturing a porous carbon material made from a plant-derived material. As the results of intensive studies, the present inventors found that it is useful to carbonize a plant-derived material followed by an acid or alkali treatment under pressurized conditions. The porous carbon material manufacturing method according to the present technology has been thus completed."
The patent application was internationally filed on Dec. 22, 2023, under International application No.PCT/JP2023/046104.
Disclaimer: Curated by HT Syndication.
