MUMBAI, India, Aug. 29 -- Intellectual Property India has published a patent application (202517075739 A) filed by Agc Inc., Tokyo, on Aug. 8, for 'method for separating vinylidene fluoride and trifluoromethane, composition, and method for producing composition.'
Inventor(s) include Otsuka, Tetsuo; Matsunami, Asuka; Mitake, Akihito; Shiota, Hidefumi; and Kamatsuka, Tatsuya.
The application for the patent was published on Aug. 29, under issue no. 35/2025.
According to the abstract released by the Intellectual Property India: "Provided is a method for separating vinylidene fluoride and trifluoromethane, which method comprises: a step for obtaining a mixture for extraction, in which a mixture containing vinylidene fluoride and trifluoromethane is mixed with a compound having a boiling point of -60 to 0 C; and a step for obtaining independently a distillate containing vinylidene fluoride as a main component and obtained by distilling the mixture for extraction, and a bottom product containing a compound having a boiling point of -60 to 0 C as a main component, and further containing trifluoromethane."
The patent application was internationally filed on Feb. 01, 2024, under International application No.PCT/JP2024/003332.
Disclaimer: Curated by HT Syndication.
