MUMBAI, India, April 11 -- Intellectual Property India has published a patent application (202517015000 A) filed by Sumitomo Seika Chemicals Co. Ltd., Hyogo, Japan, on Feb. 21, for 'method for producing water absorbent resin particles.'
Inventor(s) include Goga, Yuki; and Awaji, Naoya.
The application for the patent was published on April 11, under issue no. 15/2025.
According to the abstract released by the Intellectual Property India: "The present invention provides a method for producing water absorbent resin particles which have good general water absorption performances (such as saline absorption) required for water absorbent resins, while additionally having high gel stability and being suppressed in yellowing under high temperature and high humidity conditions. This method for producing water absorbent resin particles sequentially comprises in the following order: a step 1 in which a water-soluble ethylenically unsaturated monomer is polymerized, thereby obtaining hydrous gel particles; a step 2 in which a chelating agent, a sulfite compound and an organic antioxidant are added to the hydrous gel particles; and a step 3 in which the resulting hydrous gel particles are subjected to a surface crosslinking treatment. In the step 2, the moisture content of the hydrous gel particles when the sulfite compound is added thereto is 20% by mass to 75% by mass."
The patent application was internationally filed on Sept. 27, 2023, under International application No.PCT/JP2023/035291.
Disclaimer: Curated by HT Syndication.
