MUMBAI, India, Sept. 12 -- Intellectual Property India has published a patent application (202517080324 A) filed by Agc Inc., Tokyo, on Aug. 25, for 'method for producing vinylidene fluoride.'
Inventor(s) include Matsunami, Asuka; and Furuta, Shoji.
The application for the patent was published on Sept. 12, under issue no. 37/2025.
According to the abstract released by the Intellectual Property India: "Disclosed is a method for producing vinylidene fluoride, the method comprising a reaction step for obtaining vinylidene fluoride with use of a starting material composition that contains 1,1,2,2-tetrafluorocyclobutane and water, wherein the content of water in the starting material composition is 1000 ppm by mass or less with respect to the content of 1,1,2,2-tetrafluorocyclobutane."
The patent application was internationally filed on Feb. 09, 2024, under International application No.PCT/JP2024/004661.
Disclaimer: Curated by HT Syndication.
