Intellectual Property India Publishes Patent Application for 'Method For Producing Vinylidene Fluoride' Filed by Agc Inc.

MUMBAI, India, Sept. 12 -- Intellectual Property India has published a patent application (202517078867 A) filed by Agc Inc., Tokyo, on Aug. 20, for 'method for producing vinylidene fluoride.'

Inventor(s) include Matsunami, Asuka; and Furuta, Shoji.

The application for the patent was published on Sept. 12, under issue no. 37/2025.

According to the abstract released by the Intellectual Property India: "A method for producing vinylidene fluoride includes a reaction step for obtaining vinylidene fluoride by using a raw material composition containing 1,1,2,2-tetrafluorocyclobutane and water vapor."

The patent application was internationally filed on Feb. 09, 2024, under International application No.PCT/JP2024/004659.

Disclaimer: Curated by HT Syndication.