Intellectual Property India Publishes Patent Application for 'Method For Producing Fluorine-Containing Compounds' Filed by Agc Inc.

MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517050885 A) filed by Agc Inc., Tokyo, on May 27, for 'method for producing fluorine-containing compounds.'

Inventor(s) include Maeda, Toru; Kawakami, Takafumi; and Kawakami, Shiori.

The application for the patent was published on June 13, under issue no. 24/2025.

According to the abstract released by the Intellectual Property India: "This method for producing fluorine-containing compounds comprises introducing, in a reactor having an inner surface inert to fluorine gas, a gas containing fluorine gas into a composition containing an organic compound having at least one atom capable of being fluorinated, and thereby fluorinating the organic compound."

The patent application was internationally filed on Nov. 15, 2023, under International application No.PCT/JP2023/041155.

Disclaimer: Curated by HT Syndication.