MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517057171 A) filed by Eth Zurich, Zurich, on June 13, for 'method for producing a nano-or micro-sheet element with the help of a patterned support layer.'
Inventor(s) include Thodkar, Kishan.
The application for the patent was published on July 4, under issue no. 27/2025.
According to the abstract released by the Intellectual Property India: "A method for producing a nano- or micro-sheet element is provided, the nano- or micro-sheet element particularly being made of graphene and/or other sheet-materials. The method is based on a laminate (14) comprising a growth substrate (1), a nano- or micro-sheet layer (2) and a support layer (3). The nano- or micro-sheet layer (2) is adapted to form the nano- or micro-sheet element. The method comprises at least the step of electrochemical delamination of the laminate (14) by means of electrolysis in such a way, that the growth substrate (1) is separated from the nano- or micro-sheet layer (2) and the support layer (3). The step of electrochemical delamination of the laminate (14) is carried out with the support layer (3) having a pattern (31) with a plurality of local depressions (311) and/or elevations (312)."
The patent application was internationally filed on Dec. 12, 2023, under International application No.PCT/EP2023/085242.
Disclaimer: Curated by HT Syndication.
