Intellectual Property India Publishes Patent Application for 'Method For Degradation Of Low Density Polyethene Using Bacterial Consortium' Filed by Siksha O Anusandhan

MUMBAI, India, Nov. 28 -- Intellectual Property India has published a patent application (202431059133 A) filed by Siksha O Anusandhan, Bhubaneswar, Orissa, on Aug. 5, 2024, for 'method for degradation of low density polyethene using bacterial consortium.'

Inventor(s) include Hrudayanath Thatoi; Subhashree Rath; and Pradeep Das Mohapatra.

The application for the patent was published on Nov. 28, under issue no. 48/2025.

According to the abstract released by the Intellectual Property India: "The present invention relates to a method for degradation of low density polyethene using bacterial consortium, comprises the steps of (i) isolating ligninolytic bacteria employing a minimal salt medium encriched with lignin, (ii) preparing a sterile synthetic medium using NH4NO3, MgSO4.7H2O, K2HPO4, CaCl2.2H2O, KCl, yeast extract, micro-elements (FeSO4.6H2O, ZnSO4.7H2O, and MnSO4) in 1000 ml distilled water at a pH in the range of 4-9, (iii) adding the ligninolytic bacteria in the prepared sterile synthetic medium to prepare a bacterial consortium and (iv) treating low density polyethene with the bacterial consortium for a time duration in the range of 50-70 days."

Disclaimer: Curated by HT Syndication.