MUMBAI, India, Jan. 2 -- Intellectual Property India has published a patent application (202541122913 A) filed by Vellore Institute Of Technology, Vellore, Tamil Nadu, on Dec. 5, 2025, for 'machine learning system for clothing wear duration prediction.'
Inventor(s) include Dr. Lokeshkumar Ramasamy; and Mr. Nikhil Naganagouda Patil.
The application for the patent was published on Jan. 2, under issue no. 01/2026.
According to the abstract released by the Intellectual Property India: "The present disclosure provides a computer-implemented method (100) for predicting clothing wear duration using machine learning. The method (100) includes collecting clothing attribute data (102) including material type, fabric thickness measured in grams per square meter, usage frequency per week, average use hours per day, washing frequency per week, water temperature in degrees Celsius, storage humidity percentage, and sunlight exposure hours per day. The method (100) further includes training at least one machine learning regression model (106) using the collected clothing attribute data, evaluating performance of the at least one trained machine learning regression model (108) using statistical metrics, selecting an optimal model (110, 112, 114) based on the performance evaluation, and deploying the selected optimal model in a web-based interface (116) configured to receive user inputs and provide real-time clothing wear duration predictions in months."
Disclaimer: Curated by HT Syndication.
