MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517034803 A) filed by Massachusetts Institute Of Technology, Cambridge, U.S.A., on April 9, for 'line scanning temporally focused two photon lithography system.'
Inventor(s) include Boyden Edward; Oran Daniel; So Peter T.; and Zheng Cheng.
The application for the patent was published on June 13, under issue no. 24/2025.
According to the abstract released by the Intellectual Property India: "The present invention presents improved systems and methods for performing multi photon lithography. A line scanning temporally focused two photon lithography (LS TFTPL) technique is capable of patterning three dimensional structures with high throughput. An example LS TFTPL system may include a pulsed laser first optical components for expanding light pulses into an elongated or line cross section a digital micromirror device for modulating the light pulses with a linear pattern and dispersing spectral components of the modulated light pulses and second optical components for focusing the dispersed spectral components of the modulated light pulse at a line in or on a target material. The focused spectral components may alter the target material within selected voxels along the line where the selected voxels spatially correspond to the linear pattern."
The patent application was internationally filed on Sept. 26, 2023, under International application No.PCT/US2023/075104.
Disclaimer: Curated by HT Syndication.
