Intellectual Property India Publishes Patent Application for 'Integrated Optical Element And Forming Method Of Metasurface' Filed by Hon Hai Precision Industry Co. Ltd.

MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202414061563 A) filed by Hon Hai Precision Industry Co. Ltd., New Taipei City, Taiwan, on Aug. 13, 2024, for 'integrated optical element and forming method of metasurface.'

Inventor(s) include Yu-Heng Hong; Wen-Cheng Hsu; Wen-Chien Miao; Yao-Wei Huang; and Hao-Chung Kuo.

The application for the patent was published on June 6, under issue no. 23/2025.

According to the abstract released by the Intellectual Property India: "An integrated optical element (100) includes a light-emitting device layer (200) and a metasurface (300) over the light-emitting device layer (200). The metasurface (300) includes a plurality of conductive layers (340), a first dielectric layer (350) and a first transparent conductive layer (360). The conductive layers (340) are arranged along a first direction (D1), in which each of the conductive layers (340) has a plurality of holes (H). The first dielectric layer (350) covers the conductive layers (340). The first transparent conductive layer (360) covers the first dielectric layer (350)."

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