MUMBAI, India, July 25 -- Intellectual Property India has published a patent application (202414093560 A) filed by Nihon Techno Co. Ltd., Nagano, Japan, on Nov. 29, 2024, for 'industrial liquid cleaning device.'
Inventor(s) include Hama, Motoaki.
The application for the patent was published on July 25, under issue no. 30/2025.
According to the abstract released by the Intellectual Property India: "There is provided an industrial liquid cleaning device which, by removing bacteria contained in an industrial liquid and crystallizing components that would precipitate as scale, enables the industrial liquid to be used for an extended period. The industrial liquid cleaning device (100) includes: a pump (30) that sucks and discharges an industrial liquid from a vessel containing the industrial liquid; a flow path (40) on which the industrial liquid sucked out from the vessel flows; a filter unit (50) that filters the industrial liquid; and a magnetic field generating unit (60) that generates a magnetic field that is passed through the industrial liquid flowing on the flow path (40), wherein both a suction port and a discharge port of the flow path (40) are open to an inside of the vessel."
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