MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517049748 A) filed by Dai Nippon Printing Co. Ltd., Tokyo, on May 23, for 'illumination system, illumination light observation system, illumination light imaging system, illumination device, and design method for illumination system.'
Inventor(s) include Kurashige Makio; and Nishio Shumpei.
The application for the patent was published on June 13, under issue no. 24/2025.
According to the abstract released by the Intellectual Property India: "An illumination system (30) comprises a projection surface (40) and an illumination device (50). The projection surface (40) is parallel to a first direction (D1) and a second direction (D2) perpendicular to the first direction (D1). The illumination device (50) projects a projection pattern (41), which extends in the first direction (D1), onto the projection surface (40). The illumination device (50) has a light source (51), and a diffraction optical element (55) that forms the projection pattern (41) by diffracting light from the light source (51). The diffraction optical element (55) includes a plurality of element diffractive optical elements (56), each of which diffracts light from the light source (51). The shortest length (Lb1) among the lengths in the second direction (D2) of the projection pattern (41) is shorter than the greatest length (Lc) among the lengths at which light incident on the diffraction optical element (55) intersects with a plane parallel to the projection surface (40), and is greater than the greatest length (La) among the lengths at which the component diffraction optical elements (56) intersect with the plane parallel to the projection surface (40)."
The patent application was internationally filed on Oct. 25, 2023, under International application No.PCT/JP2023/038603.
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