MUMBAI, India, Sept. 12 -- Intellectual Property India has published a patent application (202517079850 A) filed by Hitachi Industrial Equipment Systems Co. Ltd., Tokyo, on Aug. 22, for 'gas compressor.'
Inventor(s) include Sano Shotaro; Chiba Kotaro; Sakai Kohei; Nikaido Sho; and Matsuzaka Takehiro.
The application for the patent was published on Sept. 12, under issue no. 37/2025.
According to the abstract released by the Intellectual Property India: "Provided is a technique capable of detecting a position and a degree of drain discharge abnormality. A two-stage gas compressor 100 is provided with: a low-pressure stage compressor body 3 for compressing gas; a compressed gas cooler 5 for cooling the compressed gas compressed by the low-pressure stage compressor body 3; a drain separator 7 for separating drain from the compressed gas cooled by the compressed gas cooler 5; drain discharge paths 71, 72 for sending the drain separated by the drain separator 7 to the outside of the two-stage gas compressor 100; a drain discharge valve 13 for discharging the separated drain by opening/closing at a predetermined interval; a drain discharge path pressure sensor 17 provided downstream of the drain discharge valve 13 and measuring pressure in the drain discharge path 72; and a control unit 10 for determining the position and degree of discharge abnormality of the drain on the basis of the pressure measured by the drain discharge path pressure sensor 17."
The patent application was internationally filed on Nov. 08, 2023, under International application No.PCT/JP2023/040140.
Disclaimer: Curated by HT Syndication.
