MUMBAI, India, Sept. 26 -- Intellectual Property India has published a patent application (202547082087 A) filed by Alixlabs AB, Lund, Sweden, on Aug. 29, for 'formation of an array of nanostructures.'
Inventor(s) include Suyatin, Dmitry; Karimi, Amin; Jafari Jam, Reza; Ilarionova, Yoana; Muhammad, Asif; and Sundqvist, Jonas.
The application for the patent was published on Sept. 26, under issue no. 39/2025.
According to the abstract released by the Intellectual Property India: "A method for forming an array of nanostructures is presented. The method comprising: providing a layer structure including an array of first sacrificial nanostructures arranged on a supporting layer structure comprising at least a first material layer and a substrate; selectively applying spacer structures on sidewalls of the array of first sacrificial nanostructures; selectively etching away the array of first sacrificial nanostructures such that the spacer structures form an array of second sacrificial nanostructures; etching the first material layer using the array of second sacrificial nanostructures as an etching mask; and removing the array of second sacrificial nanostructures thereby exposing an array of nanostructures formed from the first material layer."
The patent application was internationally filed on Feb. 26, 2024, under International application No.PCT/EP2024/054786.
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