MUMBAI, India, Nov. 14 -- Intellectual Property India has published a patent application (202517095147 A) filed by Sanyo Trading Co. Ltd.; and Moritsune Co. Ltd., Tokyo, on Oct. 3, for 'fabric and fabric production method.'
Inventor(s) include Mori Tsunehide; Aoki Takashi; Higashi Hirokazu; and Nakamura Hiroyuki.
The application for the patent was published on Nov. 14, under issue no. 46/2025.
According to the abstract released by the Intellectual Property India: "Provided is woven or knitted fabric that has a pattern expressed through embossing, and that comprises: a fabric layer; and a resin film layer laminated on the fabric layer. The fabric layer and the resin film layer may be embossed. In the fabric, the melting point of the resin film layer may be lower than the melting point of the fabric layer. Also provided is a fabric production method comprising: a step for preparing a woven or knitted fabric layer; a step for laminating a resin film layer on the fabric layer; and a step for embossing the fabric layer and the resin film layer."
The patent application was internationally filed on Sept. 08, 2023, under International application No.PCT/JP2023/032855.
Disclaimer: Curated by HT Syndication.
