MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517054584 A) filed by Tokuyama Corporation, Yamaguchi, Japan, on June 6, for 'electrolysis device.'
Inventor(s) include Matsui, Hitoshi.
The application for the patent was published on July 4, under issue no. 27/2025.
According to the abstract released by the Intellectual Property India: "Provided is a zero-gap electrolysis device in which there is no need to apply special processing to a peripheral flange of an anode chamber assembly, a peripheral flange of a cathode chamber assembly, and a gasket, thus being capable of reducing manufacturing costs, and that also makes it possible to arrange the gasket and a film in a sufficiently simple and quick manner without requiring a complicated operation. In the zero-gap electrolysis device, a plurality of electrolytic cell units each constituted of the anode chamber assembly and the cathode chamber assembly are stacked in a lateral direction. The anode chamber assembly (cathode chamber assembly) includes a partition wall, a peripheral flange extending along a peripheral edge of the partition wall, a gasket extending along an inner surface of the peripheral flange, an anode (cathode), and a film. One side of the gasket is bonded to the inner surface of the flange. A one-side peripheral edge section of the film abuts on the other side of the gasket, and an adhesive tape is affixed across the other side of the gasket and an other-side peripheral edge section of the film."
The patent application was internationally filed on Nov. 28, 2023, under International application No.PCT/JP2023/042589.
Disclaimer: Curated by HT Syndication.
