MUMBAI, India, April 17 -- Intellectual Property India has published a patent application (202531096208 A) filed by Narula Institute Of Technology, Kolkata, West Bengal, on Oct. 7, 2025, for 'ecodry ml: optimized laundry drying with machine learning.'
Inventor(s) include Dr. Papri Ghosh; Dr. Subhram Das; Ms. Debrupa Pal; Dr. Md. Ashifuddin Mondal; and Ms. Swarnali Daw.
The application for the patent was published on April 17, under issue no. 16/2026.
According to the abstract released by the Intellectual Property India: "This invention presents an intelligent cloth drying system using machine learning to optimize the drying process. The system utilizes sensors to gather real-time data about the drying load and environmental conditions. A machine learning model processes this data to determine the most suitable drying cycle. A feedback mechanism updates the model for continuous learning and improvement. The system significantly enhances energy efficiency, reduces drying time, and protects fabric quality."
Disclaimer: Curated by HT Syndication.
