MUMBAI, India, Nov. 7 -- Intellectual Property India has published a patent application (202514028059 A) filed by Caterpillar Inc., Peoria, U.S.A., on March 25, for 'duct for aftertreatment system.'
Inventor(s) include Biswas, Shib Shankar.
The application for the patent was published on Nov. 7, under issue no. 45/2025.
According to the abstract released by the Intellectual Property India: "A duct for an aftertreatment system includes a body defining a first end and a second end and a flange coupled to the body at the first end of the body. The flange defines an outer edge. The duct includes a projection coupled to and extending from the flange along a first direction. The projection and the flange lie in a same plane. The projection defines a first side edge and a second side edge that is angularly spaced apart from the first side edge. The duct is adapted to be coupled with a component of the aftertreatment system via each of the outer edge of the flange, the first side edge of the projection, and the second side edge of the projection. The component includes at least one of a diesel oxidation catalyst of the aftertreatment system and a selective catalytic reduction module of the aftertreatment system."
Disclaimer: Curated by HT Syndication.
