MUMBAI, India, Sept. 26 -- Intellectual Property India has published a patent application (202547083239 A) filed by Abb Schweiz Ag; and Nanesa S. R. L., Baden, Switzerland, on Sept. 2, for 'dry mechanism with multilayer coating.'
Inventor(s) include Zhao, Su; Andersson, Anna; Johansson, Erik; Bartolini, Gabriele; Fabbri, Lorenzo; and Piciollo, Emanuele.
The application for the patent was published on Sept. 26, under issue no. 39/2025.
According to the abstract released by the Intellectual Property India: "The present disclosure relates to a mechanism comprising a plurality of parts of which a first part comprises a first contact surface and a second part comprises a second contact surface arranged to move in relation to, and in contact with, the first contact surface. The first contact surface is provided by a multilayer coating (4) directly on a surface (5) of a metallic substrate of the first part. The multilayer coating comprises: a base layer arrangement (43) arranged directly on the surface of the substrate; a composite layer (41) arranged on top of the base layer arrangement, the composite layer consisting of particles (7) of a Graphene and Related Materials (GRM) material in a metal matrix (8); and a metallic top layer (42) arranged directly on top of the composite layer."
The patent application was internationally filed on Feb. 03, 2023, under International application No.PCT/EP2023/052713.
Disclaimer: Curated by HT Syndication.
