Intellectual Property India Publishes Patent Application for 'Dispense Volume Adjustment Based On Gap Width Of Located Features' Filed by Illinois Tool Works Inc.

MUMBAI, India, Oct. 31 -- Intellectual Property India has published a patent application (202517093638 A) filed by Illinois Tool Works Inc., Glenview, U.S.A., on Sept. 29, for 'dispense volume adjustment based on gap width of located features.'

Inventor(s) include Agarwal, Sunny; and Forget, Ronald J.

The application for the patent was published on Oct. 31, under issue no. 44/2025.

According to the abstract released by the Intellectual Property India: "A method of depositing material on an electronic substrate with a dispensing system includes acquiring an image of a first feature of a first component and an adjacent second feature of a second component, performing a measure command to measure an actual distance of a gap between the first feature of the first component and the second feature of the second component, dividing the length of the gap into segments to determine a gap width for each segment, based on the gap width, determining a number of dots to be dispensed by the dispensing unit for each segment, and performing the dispense operation for each segment."

The patent application was internationally filed on Mar. 05, 2024, under International application No.PCT/US2024/018476.

Disclaimer: Curated by HT Syndication.