MUMBAI, India, March 13 -- Intellectual Property India has published a patent application (202517123706 A) filed by Caihong Display Devices Co. Ltd., Shaanxi, China, on Dec. 8, 2025, for 'design method and device for molding annealing transverse temperature distribution for pull increase.'
Inventor(s) include Li, Menghu; Hou, Hongrong; Chao, Yaoding; and Hu, Weidong.
The application for the patent was published on March 13, under issue no. 11/2026.
According to the abstract released by the Intellectual Property India: "The present invention belongs to the technical field of glass substrate manufacturing. Disclosed are a pull rate increasing method and device for designing forming and annealing transverse temperature distribution. In the design method provided in the present invention, on the basis of six physical flow state characteristics of glass in an overflow, forming and annealing region, a forming and annealing process of a glass substrate is divided into an overflow area, a thickness formation area, a pre-annealing area, a soaking area, an annealing area and a subsequent annealing area. Moreover, in different annealing regions, differentiated transverse temperature distribution strategies are used, thereby realizing precise control of the design of glass forming and annealing transverse temperature distribution; and "temperature difference * structural difference * thermal stress" is used to deeply analyze a mechanism in a glass annealing process, thereby providing a more scientific and rational method for the warpage magnitude and curved-surface shape of the glass after the glass is annealed and cooled to room temperature. The method and the device are particularly suitable for the design of temperature distribution in forming and annealing regions of a glass substrate, which has a high pull rate and a large width and is thin."
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