Intellectual Property India Publishes Patent Application for 'Design And Development Of A Cost-Effective Aerosol-Assisted Nanostructured Thin-Film Deposition Technique' Filed by Abbas Sayyad Pathan; Yogesh Vitthal Hase; Sandeep Annasaheb Arote; Sanjaykumar Nanasaheb Dalvi; Omkar Sudam Thorat; Abhijit Sakharam Landge; Mayur Balasaheb Kadu; and Sandesh Rohidas Jadkar

MUMBAI, India, Jan. 23 -- Intellectual Property India has published a patent application (202521123146 A) filed by Abbas Sayyad Pathan; Yogesh Vitthal Hase; Sandeep Annasaheb Arote; Sanjaykumar Nanasaheb Dalvi; Omkar Sudam Thorat; Abhijit Sakharam Landge; Mayur Balasaheb Kadu; and Sandesh Rohidas Jadkar, Akole, Maharashtra, on Dec. 6, 2025, for 'design and development of a cost-effective aerosol-assisted nanostructured thin-film deposition technique.'

Inventor(s) include Abbas Sayyad Pathan; Yogesh Vitthal Hase; Sandeep Annasaheb Arote; Sanjaykumar Nanasaheb Dalvi; Omkar Sudam Thorat; Abhijit Sakharam Landge; Mayur Balasaheb Kadu; and Sandesh Rohidas Jadkar.

The application for the patent was published on Jan. 23, under issue no. 04/2026.

According to the abstract released by the Intellectual Property India: "Nanotechnology encompasses the synthesis and manipulation of materials at the nanometer scale, where quantum confinement and surface-to-volume ratio effects result in pronounced modifications to their physicochemical properties. Several physical and chemical methodologies have been developed for the fabrication of nanomaterials; many of these approaches are constrained by high operational costs, reliance on elevated temperatures, vacuum environments, and sophisticated instrumentation. To address these limitations, the present study introduces an aerosol-assisted nanostructured thin-film deposition technique. It has an advancement over conventional spray pyrolysis by substituting the spray nozzle with a nebulizer, thereby generating fine, monodisperse aerosols. The resulting aerosol facilitates uniform, reproducible thin-film growth, yielding structural and functional characteristics comparable to those achieved via chemical vapor deposition. The proposed setup eliminates the need for complex infrastructure while maintaining comparable thin-film quality. This work highlights the potential of the aerosol-assisted approach as a scalable and economical alternative for emerging thin-film fabrication technologies."

Disclaimer: Curated by HT Syndication.