MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517058485 A) filed by Apr Co. Ltd., Seoul, Republic of Korea, on June 18, for 'cosmetic procedure device control method.'
Inventor(s) include Ji, Jong Chul; Lee, Gyoun Jung; and Park, Seung Woo.
The application for the patent was published on July 4, under issue no. 27/2025.
According to the abstract released by the Intellectual Property India: "A cosmetic procedure device control method is disclosed. The cosmetic procedure device control method according to one aspect of the present invention comprises: a skin suction step of forming negative pressure in a suction space so as to suction the skin into the suction space; a skin height detection step of detecting the height of the skin suctioned into the suction space; and a high frequency application determination step of determining whether to operate a high frequency application unit according to the height of the skin determined in the skin height detection step, wherein the skin height detection step can detect the number of electrode ends that are in contact with the skin and conduct electricity from among a plurality of electrode ends of the high frequency application unit."
The patent application was internationally filed on Dec. 22, 2023, under International application No.PCT/KR2023/021476.
Disclaimer: Curated by HT Syndication.
