MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517056375 A) filed by Basf Se, Ludwigshafen am Rhein, Germany, on June 11, for 'closed loop recycling concept for composites comprising covalent adaptable poly(ureaurethane) networks with dynamic hindered urea bonds.'
Inventor(s) include Hammer, Larissa Maria; and Geyer, Florian Ludwig.
The application for the patent was published on July 4, under issue no. 27/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a process for recycling a composition comprising a poly(urea- urethane) polymer with hindered urea bonds comprising the treatment of the composition comprising the poly(urea-urethane) polymer under conditions suitable to at least partially cleave the urea bonds of the polymer to give a mixture (M1) containing prepolymers. The present invention also relates to the prepolymer obtained or obtainable according to the process, a poly(urea-urethane) polymer obtained or obtainable according to the process according to the present invention as well as the use of said prepolymer for the preparation of a poly(urea-urethane) polymer."
The patent application was internationally filed on Nov. 14, 2023, under International application No.PCT/EP2023/081743.
Disclaimer: Curated by HT Syndication.
