Intellectual Property India Publishes Patent Application for 'Cleaning Control Method And Apparatus Of Cleaning Base Station, Cleaning Base Station And Storage Medium' Filed by Beijing Roborock Innovation Technology Co. Ltd.

MUMBAI, India, Sept. 26 -- Intellectual Property India has published a patent application (202537069603 A) filed by Beijing Roborock Innovation Technology Co. Ltd., Beijing, on July 22, for 'cleaning control method and apparatus of cleaning base station, cleaning base station and storage medium.'

Inventor(s) include Long, Yongji; Liu, Yang; Liang, Zhenyu; Zhang, Tongsheng; and Zhang, Zhenpeng.

The application for the patent was published on Sept. 26, under issue no. 39/2025.

According to the abstract released by the Intellectual Property India: "A cleaning control method and apparatus of a cleaning base station, a cleaning base station and a storage medium. The cleaning control method comprises: when a cleaning base station cleans a cleaning device, according to the movement direction and the movement position of a rolling brush (1) in a rolling brush cleaning mechanism (E) in a rolling channel (2), controlling the rotation speed of the rolling brush (1) and/or the water output amount of a water supply mechanism (B) (S301)."

The patent application was internationally filed on Dec. 19, 2023, under International application No.PCT/CN2023/139934.

Disclaimer: Curated by HT Syndication.