MUMBAI, India, Nov. 7 -- Intellectual Property India has published a patent application (202421035257 A) filed by Dr. Deokate Ramesh Jivaram; and Mr. Bulakhe Suraj Chandrabhan, Pune, Maharashtra, on May 3, 2024, for 'chemical synthesis process for nickel oxide thin film and used for oxygen evolution reaction.'
Inventor(s) include Dr. Deokate Ramesh Jivaram; and Mr. Bulakhe Suraj Chandrabhan.
The application for the patent was published on Nov. 7, under issue no. 45/2025.
According to the abstract released by the Intellectual Property India: "The present work describes the chemical synthesis process for the deposition of crystalline Nickel oxide (NiO) thin film on Nickel foam (Ni-foam) substrates placed in contact with aqueous solutions. The deposition of NiO thin film over Ni-foam substrates carried out using aqueous precursor solutions of Nickel nitrate with varying deposition time and precursor's concentration at constant potential of-0.9 V. The effects of the preparative parameters on the electrochemical performance were studied. The XRD and SEM analyses of NiO thin film confirmed a cubic nature and interconnected porous nanoflakes morphology useful or water splitting application. The prepared material is used for oxygen evaluation reaction (OER) application with significant Faradic efficiency."
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