MUMBAI, India, April 20 -- Intellectual Property India has published a patent application (202514089542 A) filed by Koei Chemical Company, Limited, Chiba, Japan, on Sept. 19, 2025, for 'blocked polyisocyanate composition, curable resin composition comprising the composition, and cured product.'
Inventor(s) include Onoda, Mitsuki; and Sasaki, Kasumi.
The application for the patent was published on April 17, under issue no. 16/2026.
According to the abstract released by the Intellectual Property India: "Provided is a blocked polyisocyanate composition having excellent storage stability, a curable resin composition comprising the blocked polyisocyanate composition, and a cured product. Specifically, provided is a blocked polyisocyanate composition comprising a blocked polyisocyanate compound in which an isocyanate group of a polyisocyanate compound is blocked with a secondary amine compound represented by the following Formula (1), and an amine compound represented by at least one formula selected from the group consisting of Formulas (2-1), (2-2), (2- 3), and (2-4)."
Disclaimer: Curated by HT Syndication.
