MUMBAI, India, April 17 -- Intellectual Property India has published a patent application (202621022869 A) filed by Rajarambapu Institute Of Technology, Walwa, Maharashtra, on Feb. 26, for 'automated multi-substrate silar deposition system with ai feedback and energy recovery.'
Inventor(s) include Prof. Juber M Mulla; Prof. Shreedhar Deshmukh; Dr. Sachin B. Khot; Aaryan Sanjay Jadhav; Snehal Shinde; and Utkarsh Jagtap.
The application for the patent was published on April 17, under issue no. 16/2026.
According to the abstract released by the Intellectual Property India: "This invention describes an automated thin-film deposition system for performing successive ionic layer adsorption and reaction (SILAR) processes is disclosed. The system features a motorized turntable for multi-substrate processing, with each substrate capable of independent recipe execution. In-situ turbidity and pH sensors enable real-time chemical bath monitoring, facilitating closed-loop adjustments to deposition parameters. A mobile-connected control unit integrates an AI-based optimizer that recommends recipe modifications based on historical data and target film characteristics. An optional controlled-atmosphere enclosure provides humidity, temperature, and inert gas regulation for sensitive materials. The system incorporates a regenerative energy recovery module that captures kinetic energy during mechanical deceleration to power auxiliary electronics, enabling solar or battery operation. Built on open-source hardware and software platforms, the system is designed for reproducibility, adaptability, and deployment in resource-limited, off-grid, or educational laboratories. The invention democratizes access to precision thin-film fabrication through intelligent automation and sustainable operation."
Disclaimer: Curated by HT Syndication.
