MUMBAI, India, June 20 -- Intellectual Property India has published a patent application (202517028805 A) filed by Gaps Technology, Llc, Slidell, U.S.A., on March 26, for 'aqueous solutions and methods of using same for remediating contaminants in contaminated gasses.'
Inventor(s) include Roe, Cliffton; and Pourciau, Jerry.
The application for the patent was published on June 20, under issue no. 25/2025.
According to the abstract released by the Intellectual Property India: "A treatment process for removing and/or remediating contaminants in a contaminated gas includes flowing a stream of the contaminated gas through a pipeline, treating the flowing stream of the contaminated gas by injecting droplets of a liquid treatment composition containing 35-55 wt % total of one or more hydroxide compounds into the flowing the stream of the contaminated gas in the pipeline such that the liquid treatment composition mixes into the contaminated gas in the flowing stream and remediates contaminants in the contaminated gas, injecting water into the mixed flowing the stream of the contaminated gas and the liquid treatment composition in the pipeline downstream of where the liquid treatment composition is injected into the pipeline, and separating the flowing stream of the treated contaminated gas from any remaining amount of the liquid treatment composition, the water and the precipitates in a separator."
The patent application was internationally filed on Aug. 29, 2023, under International application No.PCT/US2023/031403.
Disclaimer: Curated by HT Syndication.
