MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517058185 A) filed by Durr Systems Ag, Bietigheim-Bissingen, Germany, on June 17, for 'apparatus and method for treating process gas.'
Inventor(s) include Schaefer, Andreas; Rodriguez Correa, Catalina; and Keil, Andreas.
The application for the patent was published on July 4, under issue no. 27/2025.
According to the abstract released by the Intellectual Property India: "An apparatus for treating process gas from an industrial plant, comprising a main line, wherein a first end of the main line is connected to a process-gas outlet of the industrial plant for letting process gas to be treated out of the main line and a second end of the main line is connected to a process-gas inlet of the industrial plant for feeding the treated process gas into the industrial plant, and comprising an exhaust-gas branch for branching off part of the process gas from the main line into an exhaust-gas line, by way of which part of the process gas can therefore be discharged into the surroundings in the form of exhaust gas."
The patent application was internationally filed on Dec. 04, 2023, under International application No.PCT/DE2023/100938.
Disclaimer: Curated by HT Syndication.
