MUMBAI, India, Nov. 21 -- Intellectual Property India has published a patent application (202441089668 A) filed by Indian Institute Of Technology, Palakkad, Kerala, on Nov. 19, 2024, for 'apparatus and method for magneto-hydrodynamic abrasive polishing.'
Inventor(s) include Setti, Dinesh; and Chandrababu, Chamind Erakkil.
The application for the patent was published on Nov. 21, under issue no. 47/2025.
According to the abstract released by the Intellectual Property India: "The present disclosure relates to an apparatus (100) for magneto-hydrodynamic abrasive polishing of the workpiece is disclosed. The apparatus includes a container (102) with conducting fluid (104) and suspended abrasive particles (106), a magnet (108) generating a magnetic field, and electrodes (110) connected to a DC power supply (112). The potential difference across the electrodes induces an electric current, producing a Lorentz force that drives the fluid and abrasive particles. This movement allows the abrasive particles (106) to interact with a workpiece surface (114), resulting in abrasive erosion and polishing. The apparatus is effective for polishing complex geometries and materials such as metals, ceramics, and composites. The process is optimized by adjusting the potential difference or magnetic field strength, achieving a target fluid velocity of approximately 500 mm/s for enhanced polishing."
Disclaimer: Curated by HT Syndication.
