MUMBAI, India, Feb. 13 -- Intellectual Property India has published a patent application (202521132649 A) filed by Ayushi Parmar, Mehsana, Gujarat, on Dec. 27, 2025, for 'antimicrobial nasal conformer.'
Inventor(s) include Ayushi Parmar; Trivedi Achyut; Heena K. Patel; Kalpesh Patel; Ravi Barot; Amitkumar Baldevbhai Patel; Harshil Modi; Hardik Amrutlal Patel; Pradip Kumar Chaudhari; Viral Chauhan; Shagun Varshney; Parth Raval; and Bhavesh Kumar Patel.
The application for the patent was published on Feb. 13, under issue no. 07/2026.
According to the abstract released by the Intellectual Property India: "The invention relates to an antimicrobial nasal conformer comprising a polyether ether ketone (PEEK) material functionalized with green-synthesized silver nanoparticles (AgNPs) for enhanced postoperative infection resistance. The process involves synthesizing AgNPs using Ficus racemosa leaf extract, followed by surface activation of PEEK with 3-aminopropyltriethoxysilane (APTES) to promote durable nanoparticle adhesion. Sonication-assisted coating ensures uniform AgNP distribution and strong bonding, resulting in a stable, non-leaching antimicrobial surface. The conformer exhibits enhanced bacterial growth inhibition against Escherichia coli, with maintained performance after repeated sterilization cycles. The invention offers a sustainable, biocompatible, and durable nasal conformer, thereby reducing the risk of infection and enhancing postoperative healing outcomes."
Disclaimer: Curated by HT Syndication.
