MUMBAI, India, April 20 -- Intellectual Property India has published a patent application (202617001322 A) filed by Numat Technologies, Inc.; and Government Of The United States, Chicago, on Jan. 6, for 'adsorptive fabric construction.'
Inventor(s) include Pomerantz, Natalie L.; Richardson, Rachelle; Galphin, Benjamin; Vermeulen, Nicolaas; Argueta Fajardo, Edwin Alfonso; Morris, William; Fuller, Patrick E.; and Whitney-Warner, Javan L.
The application for the patent was published on April 17, under issue no. 16/2026.
According to the abstract released by the Intellectual Property India: "A multi-layer fabric construction for protection from airborne toxic chemical agents comprises an optional inner comfort layer, a carbon layer, an adsorbent adhesive layer comprising a metal organic framework material, a vapor permeable layer, and an outer layer. The multi-layer fabric construction is substantially free of air pockets to reduce the thermal burden on an individual wearing a garment fabricated from the multi-layer fabric construction. The MOF can be a zirconium MOF. Also disclosed is a method of making the multi-layer fabric construction."
The patent application was internationally filed on June 06, 2024, under International application No.PCT/US2024/032841.
Disclaimer: Curated by HT Syndication.
