MUMBAI, India, Oct. 11 -- Intellectual Property India has published a patent application (202517089438 A) filed by Setolas Holdings, Inc., Kagawa, Japan, on Sept. 19, for 'additive for mushroom culture medium.'

Inventor(s) include Nakamura, Hajime.

The application for the patent was published on Oct. 10, under issue no. 41/2025.

According to the abstract released by the Intellectual Property India: "Provided is an additive for a mushroom culture medium, the additive having novel acid control characteristics. This additive for a mushroom culture medium comprises one or more acid control agents and has such acid control characteristics by modified Fuchs method using oxalic acid that pH 2.2 or more is maintained for at least 35 minutes from the start of the measurement and pH 6.8 or less is maintained after 5 minutes from the start of the measurement and onwards."

The patent application was internationally filed on Feb. 13, 2024, under International application No.PCT/JP2024/004856.

Disclaimer: Curated by HT Syndication.