MUMBAI, India, Jan. 23 -- Intellectual Property India has published a patent application (202511124354 A) filed by Indian Institute Of Technology, New Delhi, on Dec. 9, 2025, for 'a system and a method for generating an engineered beam for speckle reduction.'
Inventor(s) include Khare, Kedar; Dixit, Abhishek; and Dubey, Sakshi.
The application for the patent was published on Jan. 23, under issue no. 04/2026.
According to the abstract released by the Intellectual Property India: "A system (10) includes a linearly polarized light source (14) configured to generate a linearly polarized light beam (24). A Stress Engineered Optical Element (SEOE) device (16) is configured to receive the generated linearly polarized light beam (24) from the linearly polarized light source (14) and generate the engineered light beam (12), using stress-induced birefringence. An optical lens (18) is configured to receive and focus the engineered light beam (12). A random phase screen (20) is configured to perform a phase distortion of the engineered light beam (12) to generate a speckled beam profile. An intensity camera (22) is configured to sense the generated speckled beam profile due to the phase distortion of the engineered light beam (12)."
Disclaimer: Curated by HT Syndication.
