MUMBAI, India, Aug. 8 -- Intellectual Property India has published a patent application (202421007441 A) filed by Reliance Industries Limited, Maharashtra, on Feb. 3, 2024, for 'a process for the preparation of an attrition resistant high pore volume silica-alumina material.'
Inventor(s) include Kumar Anuj; Thangaraju Murugan, Sankaranarayanan; Ravichandran Gopal; and Das Asit Kumar.
The application for the patent was published on Aug. 8, under issue no. 32/2025.
According to the abstract released by the Intellectual Property India: "The present disclosure relates to a process for the preparation of attrition resistant high pore volume silica-alumina material. The attrition resistant high pore volume silica-alumina materials obtained by hydrothermal treatment of silica and alumina gel or sol. The process is simple, efficient, cost effective, and provides high pore volume silica-alumina precursor as well as attrition resistant high pore volume silica-alumina material."
Disclaimer: Curated by HT Syndication.
