Intellectual Property India Publishes Patent Application for 'A Process For Removing Gas-Phase Trace Metals, Hydrides, And Selenides From Syngas' Filed by Indian Institute Of Technology

MUMBAI, India, Oct. 31 -- Intellectual Property India has published a patent application (202411028688 A) filed by Indian Institute Of Technology, New Delhi, on April 8, 2024, for 'a process for removing gas-phase trace metals, hydrides, and selenides from syngas.'

Inventor(s) include Mhatre, Dwijraj Prashant; and Bhatia, Divesh.

The application for the patent was published on Oct. 31, under issue no. 44/2025.

According to the abstract released by the Intellectual Property India: "The present disclosure generally relates to the field of the field of energy and chemical technology. Specifically, the present disclosure relates to a process for removing gas-phase trace metals, hydrides, and selenides from syngas containing high amounts of water (0 to 25 vol. %) at high temperature (100 to 400 C)."

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