MUMBAI, India, Jan. 9 -- Intellectual Property India has published a patent application (202511118119 A) filed by Dr. B. R. Ambedkar National Institute Of Technology, Jalandhar, Punjab, on Nov. 27, 2025, for 'a process for preparing antimicrobial poly(styrene)-poly (methyl methacrylate)-toluene coatings.'
Inventor(s) include Devyani Thapliyal; Dr. Raj Kumar Arya; Dr. George D. Verros; and Dr. Anee Mohanty.
The application for the patent was published on Jan. 9, under issue no. 02/2026.
According to the abstract released by the Intellectual Property India: "The present invention relates to a process for preparing an antimicrobial coating. The process includes formulating a precursor mixture by combining 5.01-10.02 wt.% poly(styrene) (PS), 5.00-10.03 wt.% poly(methyl methacrylate) (PMMA), and 1.0077-1.0001 wt.% copper oxide (CuO) nanoparticles with 88.9-78.95 wt.% toluene (TOL) solvent to obtain a polymer-solvent mixture. The precursor mixture is homogenized to ensure uniform dispersion of CuO nanoparticles and produce a stable solution. The homogenized solution is subsequently cast onto a substrate selected from glass, metal, polymeric film, or ceramic using a solution casting technique to form an antimicrobial coating film. The applied coating is dried to ensure complete evaporation of the solvent and thereafter cured at a temperature between 30 C and 70 C to enhance mechanical adhesion, structural integrity, and functional durability. The resultant coating exhibits improved antimicrobial activity due to the uniform distribution of CuO nanoparticles within the polymer matrix."
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