MUMBAI, India, Nov. 28 -- Intellectual Property India has published a patent application (202531106296 A) filed by Indian Institute Of Technology (Indian School Of Mines), Dhanbad, Jharkhand, on Nov. 3, for 'a novel ternary composite bi2wo6/bivo4/zno featuring a dual z-scheme mechanism for enhanced photodegradation of organic pollutants.'
Inventor(s) include Ravindra Singh; and Dr. Alok Sinha.
The application for the patent was published on Nov. 28, under issue no. 48/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a novel ternary heterojunction photocatalyst comprising Bi2WO6, BiVO4, and ZnO (BBZ composite) for the enhanced photocatalytic degradation of Rhodamine-B (RhB), a model organic dye pollutant commonly found in textile wastewater. This invention further comprises a process for the preparation of the ternary composite via a controlled hydrothermal-assisted deposition method, followed by thermal treatment, resulting in a stable and well-dispersed composite with optimized molar ratios. This ternary system strategically integrates the visible-light-active semiconductors Bi2WO6 and BiVO4 with ZnO, a wide-bandgap semiconductor known for its high electron mobility, to form a dual Z-scheme heterojunction that facilitates efficient charge carrier separation and directional charge transfer. The typical band alignment of the BBZ composite effectively suppresses photogenerated electron-hole recombination, thereby significantly enhancing photocatalytic performance under sunlight irradiation. Photocatalytic activity experiments reveal that the BBZ composite achieves a higher degradation rate of Rhodamine-B compared to its individual and binary composites, with approximately 90% removal efficiency within a short reaction time under sunlight irradiation. Kinetic studies reveal that the composite fits a pseudo-first-order model, demonstrating excellent reusability and structural stability over multiple cycles."
Disclaimer: Curated by HT Syndication.
