MUMBAI, India, April 17 -- Intellectual Property India has published a patent application (202541035143 A) filed by Indian Institute Of Technology, Chennai, Tamil Nadu, on April 10, 2025, for 'a method for producing graphene and an apparatus therefor.'
Inventor(s) include Sathyan Subbiah; Narasimhan Swaminathan; Shahi Nabhan A K; Wazeem Nishad; Thanga Raja T; and Vinothkumar Sundharamoorthi.
The application for the patent was published on April 17, under issue no. 16/2026.
According to the abstract released by the Intellectual Property India: "The present invention relates to a method and an apparatus for the efficient production of graphene from graphite using a liquid-phase exfoliation technique. The invention enables the production of few-layer graphene (FLG) and multilayer graphene (MLG) with high purity and improved yield. The method is scalable, cost-effective, and suitable for industrial-scale applications in fields such as electronics, energy storage applications, sensors, and coatings, among other applications."
Disclaimer: Curated by HT Syndication.
