MUMBAI, India, April 17 -- Intellectual Property India has published a patent application (202641043126 A) filed by Bharrathi Sree G; and Sree Varshan G, Kovilpatti, Tamil Nadu, on April 4, for 'a method for halogen-free one-pot synthesis of nitrogen-doped holey carbon nanosheets.'
Inventor(s) include Sree Varshan G.
The application for the patent was published on April 17, under issue no. 16/2026.
According to the abstract released by the Intellectual Property India: "The present invention provides a halogen-free, one-pot method (100) for synthesizing nitrogen-doped holey carbon nanosheets functionalized with multi-metallic oxides. A precursor composition (102) comprising expandable graphite, an organic nitrogen-rich blowing agent, an alkali etchant, a multi-metallic nitrate blend, and a multi-component organic flux comprising rosin, stearic acid, and citric acid is subjected to a staged thermal profile within a sealed batch reactor. During heating, the organic flux melts (104) to disperse the components, chelate metal ions, and facilitate capillary transport into interlaminar regions of the graphite. Further heating causes decomposition (106) of the blowing agent to generate nitrogen-rich gases, resulting in exfoliation and nitrogen doping. Concurrently, the alkali etchant reacts (108) to form nanopores within the carbon lattice, and the metal nitrates decompose to form multi-metallic oxide nanoparticles anchored onto the carbon structure."
Disclaimer: Curated by HT Syndication.
