MUMBAI, India, Feb. 13 -- Intellectual Property India has published a patent application (202641007491 A) filed by Vellore Institute Of Technology, Vellore, Tamil Nadu, on Jan. 26, for 'a method for fabricating photocatalytic monolithic structures using paste extrusion additive manufacturing.'
Inventor(s) include S. Hari Prakash; and Dr. S. Mohana Roopan.
The application for the patent was published on Feb. 13, under issue no. 07/2026.
According to the abstract released by the Intellectual Property India: "The present invention relates to a method for fabricating photocatalytic monolithic structures using paste extrusion additive manufacturing. A photocatalyst-containing composite paste is prepared and extruded layer by layer according to a predetermined three-dimensional geometry (100, 200). During or immediately after deposition, electromagnetic radiation is applied to induce in-situ curing of the extruded layers, thereby forming a self-supporting photocatalytic monolith without requiring thermal sintering, debinding, or drying steps (300, 400). The fabricated structures exhibit controlled geometry, porosity, and mechanical stability, as evidenced by dimensional and microscopic analysis (500-800). Structural, chemical, and optical characterisation confirm retention of photocatalyst properties within the cured matrix (900-1300). The disclosed method enables energy-efficient fabrication of reusable photocatalytic monoliths suitable for structured catalytic applications while overcoming limitations associated with powder-based and thermally processed systems."
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