MUMBAI, India, Dec. 13 -- Intellectual Property India has published a patent application (202511083842 A) filed by Indian Institute Of Technology, Roorkee, Uttarakhand, on Sept. 3, for 'a high temperature proton exchange membrane and a process for its fabrication thereof.'
Inventor(s) include Deka, Bhaskar Jyoti; Bhosale, Amit Chandrakant; and Sharma, Akshay.
The application for the patent was published on Dec. 12, under issue no. 50/2025.
According to the abstract released by the Intellectual Property India: "The present disclosure relates to a high temperature proton exchange membrane and a process for its fabrication thereof. The high temperature proton exchange membrane comprising: a) polyvinylpyrrolidone (PVP) having a weight-average molecular weight in the range of 2,70,000 to 4,00,000 grams per mole (g/mol); b) polyethersulfone (PES) having a weight-average molecular weight in the range of 25,000 to 65,000 grams per mole (g/mol); and c) silicotungstic acid (SiWA); wherein the weight ratio of polyvinylpyrrolidone (PVP) to polyethersulfone (PES) is in the range of 1:1 to 4:1; wherein polyethersulfone (PES) has a degree of sulfonation in the range of 30% to 100%; wherein the amount of silicotungstic acid (SiWA) is in the range from 1 to 15 wt% with respect to the total weight of the high temperature proton exchange membrane; wherein the silicotungstic acid (SiWA) is uniformly distributed throughout the matrix of PVP-PES crosslinked polymer."
Disclaimer: Curated by HT Syndication.
