MUMBAI, India, May 29 -- Intellectual Property India has published a patent application (202621041860 A) filed by Anup Krishnan Menon, Maharashtra, on April 1, for 'a gas-assisted stain removal process for fabrics.'
Inventor(s) include Anup Krishnan Menon.
The application for the patent was published on May 29, under issue no. 22/2026.
According to the abstract released by the Intellectual Property India: "A method for removing stains from a fabric is disclosed, wherein a cleaning composition and a gas-generating system are applied in a controlled sequence to produce in-situ gas generation within fabric fibers. The method comprises applying to a stained region a first composition including one or more cleaning agents selected from enzymes, detergents, or surfactants, and optionally a first gas-generating component. The first composition is allowed to remain in contact with the fabric for a predetermined duration to enable penetration into the fabric fibers and interaction with stain material. A second composition comprising a second gas-generating component is subsequently applied, whereby interaction between the components generates gas within the fabric structure. The generated gas forms bubbles that produce localized micro-agitation and outward pressure, facilitating lifting and removal of stain particles. The method enables controlled and delayed gas generation, improves cleaning efficiency, and reduces the need for mechanical scrubbing."
Disclaimer: Curated by HT Syndication.
