Intellectual Property India Publishes Patent Application for '10,11 -Dihydro-5h-Dibenzo[b,f]azepine Derivatives As Photoinitiatiors In Photopolymerisation For Use In Photocurable Compositions' Filed by Igm Resins Italia S. R. L.

MUMBAI, India, April 20 -- Intellectual Property India has published a patent application (202617002099 A) filed by Igm Resins Italia S. R. L., Milano, Italy, on Jan. 8, for '10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions.'

Inventor(s) include Morone, Marika; and Razzano, Vincenzo.

The application for the patent was published on April 17, under issue no. 16/2026.

According to the abstract released by the Intellectual Property India: "The present invention relates to photoinitiators of formula (I) (I) having improved performances and to their use in photopolymerization compositions. The invention also relates to a process for the photopolymerization of compositions comprising said photoinitiators as well as their use in articles of manufacture, including printed, coated, and fabricated assemblies."

The patent application was internationally filed on July 30, 2024, under International application No.PCT/IB2024/057350.

Disclaimer: Curated by HT Syndication.